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Micro channel etching characteristics enhancement by femtosecond laser processin

上传者: 2021-02-09 19:38:33上传 PDF文件 595.15KB 热度 14次
A fused silica glass micro-channel can be formed by chemical etching after femtosecond laser irradiation, and the successful etching probability is only 48%. In order to improve the micro-channel fabrication success probability, the method of processing a high-temperature lattice by a femtosecond la
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